Corning has created glass with a minimum coefficient of thermal expansion

The Corning company presented a new development that differs from the usual solutions.

This time it is not about another protected glass for gadgets, but about a fresh material with extremely low thermal expansion, designed for use in modern lithographic systems operating on Low-NA and High-NA EUV technologies.

This new material, called Extreme ULE, will to be used in the creation of photopatterns and mirrors for lithography for future device generations.

The main advantage of Extreme ULE is its minimal coefficient of thermal expansion, which allows for high uniformity in the production of photopatterns.

As stated in according to the official announcement, its ideal flatness and uniformity significantly reduce waviness, reducing the level of unwanted deviations, which makes it possible to apply advanced coatings.